Planar Sputtering Targets

Provide high purity, high density, and diversified ingredients by magnetron sputtering. Current products include planar and backing plate, bonding services.

Pure/Alloy/Compound Sputtering Targets

• Al based alloy: Al-Cu, Al-Cr, Al-Cr-Si-W, Al-Ta, Al-Ti, Al-Si, Al-Si-Cu.....

• Cr based alloy: Pure Cr, Cr-Ni, Cr-Si, Cr-Ta, Cr-Ti.....

• Mo based alloy: Pure Mo, Mo-Na, Mo-Nb, Mo-W.....

• Nb based alloy: Pure Nb, Nb-Sn.....

• Ni based alloy: Ni-Cu, Ni-Cu-Mn, Ni-Cr, Ni-Cr-Al, Ni-Cr-Cu, Ni-Cr-Si, Ni-V.....

• Si based alloy: Si-Al, Si-Nb......

• Ti based alloy: Ti-Al, Ti-Al-Si......

• W based alloy: W-Cu, W-Ti, W-Si, WC.....

CrTa Mo SiO₂

Ni-V Ti-Al-Si Cu BP

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